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FlexTRAK-WR Plasma System
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The FlexTRAK-WR plasma system is designed for high-throughput processing of semiconductor wafers up to 300mm (12 in.). The patented plasma chamber des...
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NEW FlexTRAK-2MB Plasma System
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The NEW FlexTRAK-2MB plasma treatment system is designed for high throughput in-line processing of semiconductor devices held in boats, trays, or othe...
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NEW FlexTRAK-CD Plasma System
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The FlexTRAK-CD “Compact Design” plasma system is designed for high throughput processing of lead-frame strips, laminate substrates, and other strip-t...
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XTRAK and XTRAK-IFP Plasma Systems
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Unique to the industry, the XTRAK plasma system can be configured in ion-free plasma (IFP) mode, which removes ions, electrons and photons from the pl...
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AP-1000 Batch Plasma System
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The March AP-1000 is designed to meet the rigorous demands of 24-hour operation in high-performance manufacturing environments. The system delivers qu...
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PX-Series Batch Plasma Systems
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The PX-Series control module monitors and controls the vacuum and gas flow, chamber pressure, and power level. Up to four mass controllers are connect...
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CS-1701 R.I.E. Plasma System
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The March CS-1701 Reactive Ion Etching system delivers performance often associated with high- investment etching tools. The system is excellent for m...
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NEW PM-100 Plasma System
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The PM-100 plasma system's plasma chamber is constructed of high-quality quartz that is resistant to chemicals and easy to clean. It’s designed to pro...
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